Easy exposure and procesing.
Compatible with most of the thermal plates and developers available on the market.
| BENEFITS | |
| Easy exposure and procesing.Compatible with most of the thermal plates and developers available on the market.Maximun resolution for the reproduction of stochastic screensFast ink-water balance.Enhanced constrast and stability.Runs more than 100.000 impresions without baking.Cost-efective. CTP-A plate meets user's needs and optimize the printing perfomance. |
| Technical Characteristics |
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| Thermal positive plate to operate in CTP systems with infrared (IR) laser diode between 800-850 nm. No pre-heat required. Anodized non-image area. |
Exposure / CoatingCoating colour: blue intenseContrast after development: very highDay light sensitivity: up to 2 hours exposure does not affect the plateSpectral sensitivity: 800-850 nm. Peak sensitivity at 830 nm.Compatible with most of the thermal platesetters: Creo, Heidelberg, Screen, Lüscher, etc...Required energy: 120-130 mj/cm2Image reproduction: 1-99 % at 250 lines per inch and FM screeningDevelopmentUse developer Revelith-CTP at 23oC ± 1ºCCompatible with most of the thermal plate developers on the marketDevelopment time: 30 seconds ± 5 secondsReplenishment: with the same developer at 120-140 ml/m2GummingUse Gomalux-LPWhen hardened by baking, apply Quemagum-LPDeletionUse deletion pens Dualpoint-LPBakingHardening the coating by baking enables very long runs, over 500.000 impressions, depending on press conditions.Apply Quemagum-LPBaking conditions: Static oven: 200-230°C during 5-6 minutes On-line oven: 230-250°C during 3-4 minutes |
Thermal Positve Offset CTP Plate
